National Institute of Technology Rourkela

राष्ट्रीय प्रौद्योगिकी संस्थान राउरकेला

ଜାତୀୟ ପ୍ରଯୁକ୍ତି ପ୍ରତିଷ୍ଠାନ ରାଉରକେଲା

An Institute of National Importance

Syllabus

Course Details

Subject {L-T-P / C} : CR4204 : Ceramic Coating { 3-0-0 / 3}

Subject Nature : Theory

Coordinator : Prof. Sudip Dasgupta

Syllabus

Syllabus:

Module1: Introduction: Introduction to Coating on substrate, Fundamentals of thin film, and thick film deposition, different techniques, Physical and chemical methods of deposition on substrate, Vacuum science and technology.
7 Hours
Module2: Physical Vapor deposition: Mechanism of physical vapor deposition, diffusional flux equation, Advantages and disadvantages of PVD, Point source and surface source, Target composition and stoichiometry, Sputtering, Different methods of sputtering, mechanisms, Sputtering yield
10 Hours

Module3: Chemical Vapor deposition: Introduction to CVD, Mechanisms, Different regimes of chemical vapor deposition, LPCVD, APCVD, PECVD, MOCVD, Comparison of different methods. 6 Hours

Module4: Molecular Beam Epitaxy (MBE): Introduction to MBE, Methods, different accessories, Regulators and their functions, Mechanism of deposition and its characteristics, Advantages and disadvantages, Comparison with MOCVD. 5 Hours

Module5: Other types of coating, Lithography and their properties: Diamond-like coating and its properties, Thermal barrier coatings, Electrical and mechanical properties of thin film and thick film, Electrophoretic deposition, Optical Lithography, E- beam lithography, Patterning, X- ray lithography, Dry etching, wet etching.
8 Hours

Course Objectives

  • To provide an in-depth understanding of coating techniques and thin film deposition methods.
  • To provide basic ideas on the electrical and mechanical properties of thin film and thick film deposited on a substrate.

Course Outcomes

CO1: To be able to carry out research and development in the area of functional thin film <br />CO2: To be well-versed in the fundamentals and analysis of different coating techniques. <br />CO3: To be able to analyze different properties of thin film and thick film. <br />CO4: To be able to analyze and design electrical devices using lithography, CVD, MOCVD. <br />CO5: Solve problems related to the properties of functional thin film in electronic industries.

Essential Reading

  • Albano Cavaleiro, Jeff Th. M. Hosson, Nanostructured Coatings, Spinger Link
  • Milton Ohring, Materials Science of Thin Films, Academic Press

Supplementary Reading

  • Bruce A. Tuttle (Editor), Chonglin Chen (Editor), Quanxi Jia (Editor), R. Ramesh (Editor), Advanced Dielectric, Piezoelectric and Ferroelectric Thin Films: Proceedings of the 106th Annual Meeting of The American Ceramic Society, Indianapolis, Indiana, USA 2004 (Ceramic Transactions Series) 1st Edition, Wiley-American Ceramic Society
  • Hari Singh Nalwa, Handbook of Thin Films, Elsevier

Journal and Conferences

  • Surface and Coatings Technology, Elsevier
  • Thin Solid Films, Elsevier