National Institute of Technology Rourkela

राष्ट्रीय प्रौद्योगिकी संस्थान राउरकेला

ଜାତୀୟ ପ୍ରଯୁକ୍ତି ପ୍ରତିଷ୍ଠାନ ରାଉରକେଲା

An Institute of National Importance

Syllabus

Course Details

Subject {L-T-P / C} : EE4403 : VLSI Technology { 3-0-0 / 3}

Subject Nature : Theory

Coordinator : Prof. Prasanna Kumar Sahu

Syllabus

Semiconductor review and survey of IC processing, International Technology Roadmap for Semiconductors, Silicon crystal growth and wafer preparation, Unit Processes: Substrate cleaning, Oxidation Doping techniques: Diffusion, Ion implementation Pattern transfer: mask making, Process Simulation, Process Integration, Assembly Techniques and Packaging of VLSI Devices.

Course Objectives

  • To give the student an understanding of the different design steps required to carry out a complete digital VLSI (Very-Large-Scale Integration) design in silicon
  • To provide standard CMOS fabrication processes, CMOS design rules, static and dynamic logic structures, interconnect analysis, CMOS chip layout, simulation and testing, low power techniques, design tools and methodologies, VLSI architecture

Course Outcomes

1.Gain in Engineering Knowledge <br />2. Problem Analysis in academic platform <br />3. Scope for Design and Development of electronic systems <br />4.Lifelong learning, Project management and Finance <br />5. Conduct investigations on complex problems <br />6. Product developments for engineers and Society

Essential Reading

  • S.M.Sze, VLSI Technology, Mc Graw Hill Education , 2nd Edition,2008
  • James D. Plummer, Michael Deal, and Peter D. Griffin, Silicon VLSI Technology: Fundamentals, Practice and Modeling, Prentice Hall , Prentice Hall, 2000

Supplementary Reading

  • G.S. Virdi, D.K. Kaushik, An Introduction to VLSI Technology, Standard Book House , 2016
  • Sorab K. Ghandhi, VLSI fabrication principles, John Wiley , 2nd. Edn. 2009