Syllabus

(4 hours)
Introduction to thin film: Overview and history of thin film technology, Importance and applications in modern technology, Basic concepts: Thin film thickness, Microstructure and growth modes

(4 hours)
Vacuum: Applications of vacuum, Pumping speed and throughput, vacuum pump, Rotary pump, Ionization pump, Diffusion pump, Turbomolecular pump, Sorption pump, Diaphragm pump, Cryo pump, Vacuum gauges, Pirani gauge, Penning gauge, Bayard-Alpert gauge, Vacuum system, Leak detection, Properties of substrates, Substrate cleaning

(8 hours)
Thin film deposition techniques: Physical vapor deposition (PVD): Thermal and electron beam evaporation, Flash evaporation, Glow discharge and plasma, Sputtering, Sputter yield, Pulsed laser deposition (PLD), Molecular beam epitaxy (MBE), Chemical vapor deposition (CVD): Gas kinetics, Low pressure chemical vapour deposition (LPCVD), Plasma-enhanced chemical vapor deposition (PECVD), Atomic layer deposition (ALD), Conformal coverage, Sticking coefficient, Wet chemical method: Electroplating, Spin coating, Dip coating, Spray pyrolysis

(6 hours)
Thin Film growth and microstructure: Nucleation and growth mechanisms, Epitaxy and textured growth, Influence of deposition parameters on film microstructure, Stress and strain in thin films, Lattice and thermal mismatch, Stress relaxation, Atomic nucleation process, Capillary theory, Island formation, Modes of growth: Volmer-Weber, Frank-van der Merwe, Stranski-Krastanov growth

(6 hours)
Measurement of thin films thickness and stress: Stylus profilometry, Ellipsometry, Interferometry, Cross-sectional scanning electron microscopy (SEM) and tunneling electron microscopy (TEM), Atomic force microscopy (AFM), X-ray reflectivity (XRR)

(4 hours)
Materials and properties: Metals, semiconductors and dielectric thin films, Structural and Composition, Optical properties: Transparency, reflectivity, and absorbance, Electrical properties: Conductivity, resistivity, and dielectric constant, Mechanical properties: Hardness, adhesion, and wear resistance

(4 hours)
Applications of thin films: Microelectronics, MEMS, Photovoltaics, Sensors, and flexible electronics, Antireflection coatings, Filters, and mirrors, Wear-resistant and corrosion-resistant coatings

To impart knowledge for comprehensive understanding of the principles, processes, and applications of thin film technology

Explore the relationship between deposition techniques, material properties, and thin film performance

Examine the role of thin films in various technological applications, including electronics, optics, and coatings

Equip students with the knowledge necessary to engage in research and development within the field of thin film technology

At the end of course, students will be able to gain an in-depth understanding of the principles and techniques involved in thin film deposition and characterization

To analyze and evaluate the properties of thin films for various applications

Students will develop the ability to design and optimize thin film materials for specific technological uses

To pursue research and development in the field of thin film technology

D. L. Smith, Thin-Film Deposition: Principles and Practice, McGraw-Hill , (1995)

M. Ohring, Materials Science of Thin Films, Academic Press , (2001)

K. Seshan, Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, William Andrew , (2002)

R. Grunwald, Thin Film Micro-Optics: New Frontiers of Spatio-Temporal Beam Shaping, Elsevier Science , (2007)

P. J.Dobson, M. A. Karim, Thin Film Growth: Physics, Materials Science, and Applications, Springer , (2006)

R. F. Bunshah, Handbook of Deposition Technologies for Films and Coatings: Science, Technology, and Applications, Noyes Publications , (1994)