National Institute of Technology Rourkela

राष्ट्रीय प्रौद्योगिकी संस्थान राउरकेला

ଜାତୀୟ ପ୍ରଯୁକ୍ତି ପ୍ରତିଷ୍ଠାନ ରାଉରକେଲା

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Syllabus

Course Details

Subject {L-T-P / C} : EE6149 : Nanoelectronics and MEMS { 3-0-0 / 3}

Subject Nature : Theory

Coordinator : Prasanna Kumar Sahu

Syllabus

Module 1 :

Semiconductor Physics & Carrier Behaviour: Fundamentals & Carrier Physics, Energy bands, semiconductors (intrinsic/extrinsic), equilibrium concentration, drift/diffusion.
lifetimes

Module 2 :

PN Junction Diode: Device Structure & Analysis, Poission/continuity, diode fabrication.
I-V characteristics, small-signal model, switching dynamics

Module 3 :

Nano devices, Nano materials, Nano characterisation, definition of Technology node, Basic
CMOS Process flow, MOS Scaling theory, Issues in scaling MOS transistors: Short channel effects, description of a typical 65 nm CMOS technology, requirements for Non classical
MOS transistor, MOS capacitor, role of interface quality and related process techniques,
Gate oxide thickness scaling trend, SiO2 vs High-k gate dielectrics, Integration issues of
high-k, Interface states, bulk charge, band offset, stability, reliability - Qbd high field, possible candidates, CV and IV techniques, Metal gate transistor: Motivation, requirements,
Integration Issues, Transport in Nano MOSFET, velocity saturation, ballistic transport, injection velocity, velocity overshoot, SOI - PDSOI and FDSOI, Ultrathin body SOI - double
gate transistors, integration issues, Vertical transistors - FinFET and Surround gate FET.

Course Objective

1 .

Students earn the basic understanding of nano
electronics and followed the advanced understanding of the nano-micro fabrication

2 .

Provides an advanced level of understanding of the device electronics for integrated circuits, a foundation
for device fabrication and various applications in sensor technology, optoelectronics, communication, nanotechnology, etc.

3 .

Learning of design of MEMS transducers and to explore design
tradeoffs, circuit/system issues, device performance, and manufacturing of microsystem

4 .

To expose the students to the evolution of Nanosystems and the various fabrication techniques. Also, to impart knowledge to the students about nanomaterials and various nano measurement techniques.

Course Outcome

1 .

Students will understand diverse electronic device fabrication with in-depth technical knowledge in one or more areas of specialisation.

2 .

Students will have a practical understanding of the major engineering concepts and demonstrate the application of their theoretical knowledge of the concepts, which will help them get academic and industrial jobs.

3 .

Students will be able to interact scientifically with industry both within and outside of a classroom setting.

4 .

Students will be able to develop an appreciation of continuing educational and professional development.

5 .

Students will be able to appreciate their role as engineers in society.

Essential Reading

1 .

Donald A. Neamen, Semiconductor Physics and Devices, Semiconductor Physics and Devices , 2018

2 .

Y. Taur and T. Ning, Fundamentals of Modern VLSI Devices, Cambridge University Press , 2012

Supplementary Reading

1 .

Plummer, Deal, Griffin, Silicon VLSI Technology, Pearson Education India , 2016

2 .

Jean-Pierre Colinge, Anantha Chandrakasan, Fin FETs And Other Multi Gate Transistors, Springer , 2008

Journal and Conferences

1 .