Course Details
Subject {L-T-P / C} : PH2162 : Semiconductor Technology { 2-0-0 / 2}
Subject Nature : Theory
Syllabus
| Module 1 : |
(2 hrs) Introduction, Importance of semiconductors, Semiconductor materials and properties, Compound semiconductors, Application of semiconductors, Process integration, IC Technology |
| Module 2 : |
(6 hrs) Clean room, Fabrication of Semiconductor wafers, Crystal growth, Wafer cleaning, Oxidation techniques, Doping in semiconductors, Diffusion process: Predeposition and Drive in, Diffusion profiles, Lateral diffusion, Sheet resistivity and measurement of dopant profiles, Ion implantation, Ion stopping, Ion channeling, Rapid thermal process |
| Module 3 : |
(6 hrs) Vacuum systems, Thin film growth: Wet chemical process, Physical vapor deposition, Chemical vapor deposition, Ohmic and Schottky contacts, Lithography: Resolution, Mask fabrication, Photoresists, Photolithography, e-beam lithography |
| Module 4 : |
(3 hrs) Wet and dry etching techniques, Lift-off techniques, Encapsulation, Device Isolation, Wire bonding, Packaging of semiconductor devices |
| Module 5 : |
(5 hrs) Semiconducting nanomaterials synthesis and characterizations, Nanomaterials processing, Nanolithography, MEMS, Flexible and organic electronics, Quantum devices |
Course Objective
| 1 . |
To impart knowledge on
|
| 2 . |
Basic knowledge about the synthesis and processing of semiconducting materials |
| 3 . |
Optimization of semiconductor process flow parameters |
| 4 . |
Micropatterning of semiconductors for IC fabrication |
| 5 . |
The know current trend and challenges of semiconductor devices |
Course Outcome
| 1 . |
At the end of course, students will be able to:
|
| 2 . |
CO2: Know the synthesis and characterization of electronic materials |
| 3 . |
CO3: Understand science and technology of unit processes of various devices |
| 4 . |
CO4: Manage the overall process to control quality of semiconductor devices |
| 5 . |
CO5: Micropatterning of semiconductors for IC fabrication |
Essential Reading
| 1 . |
G.S. May, S.M. Sze, Fundamentals of Semiconductor Fabrication, Wiley (2003) |
| 2 . |
S. A. Campbell, The Science and Engineering of Microelectronic Fabrication, Oxford University Press (2001) |
| 3 . |
G. Bose, IC Fabrication Technology, McGraw Hill Education (2017) |
Supplementary Reading
| 1 . |
J.D. Plummer, M.D. Deal, P.B. Griffin, Silicon VLSI Technology: Fundamentals, Practice, and Modeling, Prentice Hall (2000) |
| 2 . |
S.K. Ghandhi, VLSI Fabrication Principles: Silicon and Gallium Arsenide, Wiley-Interscience, (1994) |
| 3 . |
M. Wilson, K. Kannangara, G. Smith, M. Simmons, B. Raguse, Nanotechnology: Basic Science and Emerging Technologies, Chapman and Hall/CRC (2002) |
Journal and Conferences
| 1 . |