Syllabus

Introduction, Importance of semiconductors, Semiconductor materials and properties, Compound semiconductors, Application of semiconductors, Process integration, IC Technology (2 hours)

Clean room, Fabrication of Semiconductor wafers, Crystal growth, Wafer cleaning, Oxidation techniques, Doping in semiconductors, Diffusion process: Predeposition and Drive in, Diffusion profiles, Lateral diffusion, Sheet resistivity and measurement of dopant profiles, Ion implantation, Ion stopping, Ion channeling, Rapid thermal process (6 hours)

Vacuum systems, Thin film growth: Wet chemical process, Physical vapor deposition, Chemical vapor deposition, Ohmic and Schottky contacts, Lithography: Resolution, Mask fabrication, Photoresists, Photolithography, e-beam lithography (6 hours)

Wet and dry etching techniques, Lift-off techniques, Encapsulation, Device Isolation, Wire bonding, Packaging of semiconductor devices (3 hours)

Semiconducting nanomaterials synthesis and characterizations, Nanomaterials processing, Nanolithography, MEMS, Flexible and organic electronics, Quantum devices (5 hours)

To impart knowledge on:
Semiconducting materials and properties and their applications

Basic knowledge about the synthesis and processing of semiconducting materials

Optimization of semiconductor process flow parameters

Micropatterning of semiconductors for IC fabrication

Current trend and challenges of semiconductor devices

At the end of course, students will be able to:
Understand the characteristics of the semiconductor materials

Know the synthesis and characterization of electronic materials

Understand science and technology of unit processes of various devices

Manage the overall process to control quality of semiconductor devices

Micropattern the semiconductors for IC fabrication

G.S. May, S.M. Sze, Fundamentals of Semiconductor Fabrication, Wiley , 2003

S. A. Campbell, The Science and Engineering of Microelectronic Fabrication, Oxford University Press , 2001

G. Bose, IC Fabrication Technology, McGraw Hill Education , 2017

J.D. Plummer, M.D. Deal, P.B. Griffin, Silicon VLSI Technology: Fundamentals, Practice, and Modeling, Prentice Hall , 2000

S.K. Ghandhi, VLSI Fabrication Principles: Silicon and Gallium Arsenide, Wiley-Interscience , 1994

M. Wilson, K. Kannangara, G. Smith, M. Simmons, B. Raguse, Nanotechnology: Basic Science and Emerging Technologies, Chapman and Hall/CRC , 2002