Syllabus

Introduction, Basic properties and Lithography
Introduction and scope of the course, Crystal structure and defects, Crystal Growth methods, Wafer fabrication, Basic properties of Silicon wafers, Measurement methods, Relevant models,
Lithography: Introduction, light sources, wafer exposure systems, Photoresists: basic properties and characterization (g-line and i-line), Mask engineering, limits and future trends in technologies and models.

Thermal Oxidation and Dopant Diffusion
Thermal oxidation and Si/SiO2 interface: Basic concepts, Measurement methods, first order planar growth kinetic model, other relevant models
Dopant Diffusion, Dopant solid solubility, Diffusion from a macroscopic viewpoint, Analytical solution, models and Measurement methods.

Ion implantation and Thin film deposition
Ion Implantation: Basic concepts, High energy and low energy implants
Thin film deposition: Basic concepts, Physical Vapour Deposition (Evaporation, sputter deposition), Chemical Vapour Deposition (Atmospheric pressure CVD, Low- pressure CVD, Plasma enhanced CVD).

Etching and area of application
Etching: Wet Etching, Plasma Etching: Basics, Mechanisms, types of plasma etch systems, manufacturing methods, Application based case studies.

To provide the fundamentals and scope of fabrication at micro level.

Conveying ideas about various fabrication methods and their processes.

Describing various kinds of challenges associated at different stages.

Understanding of different areas of applications and limitations.

Know the fundamentals of micro fabrication and its importance.

Compare the different ways (dry, wet etc.) of etching and fabrication.

Understand the deposition of various films.

Analyse the challenges and limitations associated with each method.

The students can design and modify the micrdevices in different area of applications.

Plummer J.D., Deal M.D., Griffin. P.D., Silicon VLSI technology fundamentals, practice, and modelling, Prentice Hall (2000)

Madou M, Fundamentals of Microfabrication, CRC

Masliyah J.H., Bhattacharjee S., Electrokinetic And Colloid Transport Phenomena, John Wiley & Sons, INC.