Course Details
Subject {L-T-P / C} : EC6211 : VLSI Fabrication Technology { 3-0-0 / 3}
Subject Nature : Theory
Coordinator : Sougata Kumar Kar
Syllabus
| Module 1 : |
Introduction to IC Technology: Basic fabrication steps and their Importance. Environment of IC Technology: Concepts of Clean room and safety requirements, Concepts of Wafer cleaning processes and wet chemical etching techniques. Impurity Incorporation: Solid State diffusion modeling and technology Ion Implantation modeling, technology and damage annealing, characterization of Impurity profiles, Oxidation: Kinetics of Silicon dioxide growth both for thick, thin and ultra thin films, Oxidation technologies in VLSI and ULSI, Characterization of oxide films, High k and low k dielectrics for ULSI. Lithography: Photolithography, E-beam lithography and newer lithography techniques for VLSI/ULSI, Mask generation. Chemical Vapour Deposition Techniques: CVD techniques for deposition of polysilicon, silicon dioxide, silicon nitride and metal films Epitaxial growth of silicon: modeling and technology. Metal Film Deposition: Evaporation and sputtering techniques, Failure mechanisms in metal interconnects Multi-level metallization schemes. Plasma and Rapid Thermal Processing: PECVD, Plasma etching and RIE techniques RTP techniques for annealing, growth and deposition of various films for use in ULSI. BJT fabrication steps, MOSFETs fabrication: metal gate and poly gate technology, Isolation techniques, tailoring in device parameters, CMOS process, BICMOS process. |
Course Objective
| 1 . |
Explain the process flow for different microelectronic processes. |
| 2 . |
Describe the processing steps (including the chemical and physical basis,) manufacturing techniques, measurement techniques, and important output parameters. |
| 3 . |
Relate device characteristics to key process parameters. |
Course Outcome
| 1 . |
Development of VLSI Fabrication methodology for CMOS devices. Students can also develop fabrication steps for novel semiconductor devices like SOI MOSFETs, DG MOSFETs, FinFETs etc. |
Essential Reading
| 1 . |
S. M. Sze, VLSI Technology, McGraw Hill Education , 2nd Edition, 2017 |
| 2 . |
S.K.Gandhi, VLSI Fabrication Principles, Wiley , 2nd Edition, 2008 |
Supplementary Reading
| 1 . |
S. Franssila, Introduction to Microfabrication, Wiley-Blackwell , 2nd Edition, 2010 |
| 2 . |
Stephen A. Campbell, The Science and Engineering of Microelectronic Fabrication, Oxford University Press , 2nd Edition, 2012 |
Journal and Conferences
| 1 . |
EEE Transactions on Semiconductor Manufacturing |
| 2 . |
IEEE Transactions on Electron Devices |



